Espejos Láser

Laser Line Mirrors are used for beam-steering in demanding laser applications. Laser Line Mirrors are Optical Mirrors that have been designed for specific laser types or wavelengths. Edmund Optics’ Laser Line Mirrors feature dielectric coatings that have been optimized for high reflectance at specific laser wavelengths.

Edmund Optics’ offers a wide variety of Laser Line Mirrors for a range of laser types, including Nd:YAG, Excimer, Argon-Ion, Laser Diode, or Ti:Sapphire. Additionally, broadband Laser Line Mirrors are available for the Ultraviolet (UV), Visible, Near-Infrared (NIR), or Infrared (IR). Many of Edmund Optics’ Laser Line Mirrors are available for 0° or 45° angles of incidence.

Laser Line λ/20 High Tolerance Right Angle Mirrors

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

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Laser Line λ/20 High Tolerance Right Angle Mirrors

>99.5% Reflectivity at the Design Wavelength
±15 Arcsecond Angular Tolerance
High Thermal Stability Substrates

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Nd:YAG Laser Line Mirrors

>99.2% Reflectivity at Nd:YAG Harmonic Frequencies
High Laser Induced Damage Threshold Specifications
10-5 Surface Quality for Reduced Scatter in Sensitive Laser Applications
TECHSPEC® Laser Mirror Substrates and TECHSPEC® Yb:YAG Laser Line Mirrors Also Available

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Yb:YAG Laser Line Mirrors

>99.8% Reflectivity at Yb:YAG Harmonic Frequencies
Guaranteed High Laser Damage Thresholds
10-5 Surface Quality for Reduced Scatter in Laser Applications
TECHSPEC® Laser Mirror Substrates and TECHSPEC® Nd:YAG Laser Line Mirrors Also Available

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High-Energy Picosecond and Femtosecond Ultrafast Mirrors

High Laser Induced Damage Thresholds at DWL
High Reflectance for S and P Polarizations
Ideal for High-Energy Ultrafast Laser Applications
TECHSPEC® High-Performance Low GDD Ultrafast Mirrors Also Available

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Low GDD Ultrafast Mirrors

Greater than 99% Reflectivity
Coating Designs Covering 266 - 1550nm
Low Group Delay Dispersion (GDD)
TECHSPEC® High-Performance Low GDD Ultrafast Mirrors Also Available

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

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2μm Laser Line Mirrors

Laser Damage Threshold >10 J/cm² @ 2µm, 10ns, 10Hz
Designed for Holmium and Thulium Laser Sources
λ/7 Surface Accuracy

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

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Concave Laser Line Mirrors

Ideal for Focusing Laser Light
>99.8% Reflectivity at Center Wavelength
High Thermal Stability Fused Silica Substrates

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2μm Highly-Dispersive Broadband Ultrafast Mirrors

Reflectivity >99.9% Between 2000 - 2200nm
GDD of -1000fs² @ 5° AOI
Ideal for <100fs Pulse Compression of Thulium and Holmium Lasers
Broadband Ultrafast Chirped Coating

High Performance Low GDD Ultrafast Mirrors

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

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High Performance Low GDD Ultrafast Mirrors

Designed with High Reflectivity for Ultrafast Beam Steering
Ion-Beam Sputtered Coating for Low Scatter and Absorption
GDD of 0±20fs² at Design Wavelength Range

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800nm Highly-Dispersive Ultrafast Mirrors

Reflection >99.8% (p-polarization) between 780 - 830nm
Group Delay Dispersion of -1300fs² at 5° AOI
Ideal for Pulse Compression of Ti:sapphire Ultrafast Lasers
Ultrafast Chirped Coating

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1030nm Highly-Dispersive Broadband Ultrafast Mirrors

Negative GDD of -200 fs² at 5° AOI
>99.8% Reflection (p-polarization) between 950 - 1120nm
Designed for Pulse Compression of Yb:doped Fiber Lasers
Broadband Ultrafast Chirped Coating

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1030nm Highly-Dispersive Ultrafast Mirrors

Highly Negative GDD up to -1000 fs² at 7° AOI
>99.8% Minimum Reflection (p-polarization) across 60nm Bandwidth
Ideal for Dispersion Compensation of Yb:doped Fiber Lasers
Ultrafast Chirped Coating

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45° AOI Ultrafast Chirped Mirrors

High Reflectivity and Negative Group Delay Dispersion (GDD)
Ideal for Dispersion Compensation and Beam Compression @ 45° AOI
Designs for Femtosecond Lasers, Including Ti:sapphire

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Gaussian Reflectivity Mirrors

Favors Reflections of the Fundamental Mode within a Laser Cavity
Gaussian Reflectivity Profile Over the Central 4mm Aperture
Central Reflectivity from 15% up to 35%

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

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Low Cost Laser Line Mirrors

>99% Reflectivity at Design Wavelength
λ/10 Surface Accuracy
Excellent Cost to Performance Ratio

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Espejos para Láseres de Argón

Tratados superficialmente con materiales dieléctricos
Reflexión > 98%
Disponibles para todas las longitudes de onda comunes en láseres de argón

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Espejos para Láseres

Límites de daño altos de hasta 1,5J/cm²
Tratados superficialmente con materiales dieléctricos
Diseñados para láseres de longitudes de onda: 193nm y 248nm, 308nm

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Espejos para Láser de Fibra

Diseñados para láseres de fibra comunes
Reflectividad >99.2% para longitudes de onda de 1030nm hasta 1090nm
Umbral de daño alto

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Espejos Láser de Alto Rendimiento

Reflexión > 99.8% a la longitud de onda de diseño
Optimizados para rangos amplios de longitudes de onda
Diseñados para ser usados con diodos láser

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Kit de Espejos Láser Nd:YAG

El kit incluye seis espejos para los armónicos Nd:YAG y espejos de banda doble
Más del 99% de reflectividad absoluta a la longitud de onda de diseño
High Damage Thresholds
Espejos láser Nd:YAG también se venden por separado

TECHSPEC^® components are designed, specified, or manufactured by Edmund Optics. Learn More

Espejos Láser Nd:YA

Umbral de daño disponible de hasta 6 J/cm² @ 20ns @ 355nm
Reflectividad > 99,98% a 1064nm
Substratos de Cristal de Silicio UV para una Excelente Estabilidad Térmica y Temporal
Disponibles Opciones de Baja Absorción de "Ion Beam Sputtered (IBS)"