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13.5nm, 25.4mm Dia, 45° AOI, EUV Flat Mirror

Extreme Ultraviolet (EUV) Flat Mirrors

Extreme Ultraviolet (EUV) Flat Mirrors

Stock #38-760 3-4 days
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Diameter (mm):
25.40 ±0.25
Surface Flatness (P-V):
λ/10 @ 632.8nm
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Single Crystal Silicon
Back Surface:
Commercial Polish
Surface Quality:
10 - 5
Coating Specification:
Rabs >65% @ 13.5nm, 45° (s-pol)
Mo/Si Multilayer
Top Layer: Silicon
Coating Type:
Angle of Incidence (°):
Clear Aperture (%):
Design Wavelength DWL (nm):
Fine Ground
Parallelism (arcmin):
Surface Roughness (Angstroms):
<5 RMS
Thickness (mm):
6.35 ±0.508
Thickness Tolerance (mm):
Flat Mirror
Wavelength Range (nm):
12.92 - 13.90
Full Width-Half Max FWHM (nm):
Center Energy (eV):

Regulatory Compliance

Certificate of Conformance:

Product Family Description

  • Maximum Achievable Reflection at 13.5nm
  • Designed for EUV Beam Steering and Harmonic Separation
  • 5° and 45° AOI Versions Available

Extreme Ultraviolet (EUV) Flat Mirrors are multilayer mirrors designed for maximum achievable reflectance at the design wavelength and angle of incidence. These mirrors feature a coating deposited on a super-polished single crystal silicon substrate and surface roughness less than 3Å RMS. The 45° AOI mirrors are useful for steering s-polarized beams, while the 5° AOI mirrors may be used with unpolarized beams. Applications for EUV mirrors include Coherent Diffractive Imaging (CDI) and materials science research. Extreme Ultraviolet (EUV) Flat Mirrors can also serve as harmonic selectors for High Harmonic Generation (HHG) beams.

Note: Test data from each mirror's production run sample included.