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Laser Microscopy

Laser Optics

Laser Microscopy is used to image samples through the use of focused laser beams. In general Laser Microscopy applications, a sample is scanned by a focused laser beam and the intensity of the reflected beam is converted to a digital image. Confocal microscopy, also known as confocal laser scanning microscopy, offers various advantages over traditional wide-field microscopy, such as enhanced resolution, targeted imaging location, and higher image depth. Common laser microscopy techniques include super-resolution microscopy, fluorescence microscopy, and two- or multi-photon microscopy.

Edmund Optics offers a range of Laser Microscopy objectives in finite and infinite conjugate styles for use with common laser wavelengths, such as those of popular laser diodes or Nd:YAG harmonics. Our TECHSPEC® ReflX™ Objectives are reflective microscope objectives that can efficiently focus laser light without introducing any chromatic aberration. These objectives feature a rugged design to withstand exposure to moderate heat or abrasion and are ideal in applications that range from FTIR spectroscopy to semiconductor inspection. TECHSPEC® High Performance ReflX™ Objectives are also available, providing better peak-to-valley transmitted wavefront and a design that allows for angles of incidence up to 45°. Mitutoyo Objectives, with excellent performance at Nd:YAG harmonics, are ideal for integration into semiconductor inspection or laser cutting applications.

Objectivos Reflejantes REFLX™
TECHSPEC® components are designed, specified, or manufactured by Edmund Optics. Learn More

Objectivos Reflejantes REFLX™
  • Distancia de trabajo entre 19 y 31mm
  • Diseñado para la Infinidad o Conjugo Finito para Aplicaciones de Enfoque o Imagen
  • Alineación Activa para un Rendimiento Óptimo
  • Banda espectral ultraancha de 190nm a 11um sin aberración cromática
Objetivos ReflX™ de Alto Rendimiento
TECHSPEC® components are designed, specified, or manufactured by Edmund Optics. Learn More

Objetivos ReflX™ de Alto Rendimiento
  • Frente de Onda Trasmitido de (P-V) λ/4
  • Diseño de Forma Cónica para Mas Libertad de Movimiento a 45° de AOII
  • Agarres Curvados para Reducir los Efectos de Difracción
  • Distancia de trabajo entre 24 y 31mm
Objetivos Mitutoyo Corregidos para la Infinidad NIR, NUV, y UV
Objetivos Mitutoyo Corregidos para la Infinidad NIR, NUV, y UV
  • New M Plan NIR HR and M Plan UV Objectives
  • M Plan NIR HR Objectives Provide Increased Resolving Power
  • M Plan UV Ojectives Corrected at 266nm and 550nm
Objectivos Mitutoyo Corregidos para la Infinidad con Distancias de Trabajo Largos
Objectivos Mitutoyo Corregidos para la Infinidad con Distancias de Trabajo Largos
  • Distancias de Trabajo Largos, 6mm para el de 100X
  • Diseño Plan Apocromático de Alta Calidad
  • Buena Reproducción de Color
Objetivos de Enfoque para el IR de Seleniuro de Zinc
Objetivos de Enfoque para el IR de Seleniuro de Zinc
  • Máxima eficiencia con haces de hasta 5mm
  • Alineamiento con láseres HeNe
  • Alto rendimiento en el rango 2 - 12μm
Adjustable ReflX™ Objectives
TECHSPEC® components are designed, specified, or manufactured by Edmund Optics. Learn More
Liquidación
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Adjustable ReflX™ Objectives
  • Units Adjustable for Precision Alignment
  • Various Coating Options Available for Specific Wavelength Ranges
  • Finite Conjugate Design and RMS Threading Integrate Easily in Many Objective Setups

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