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25.4mm Dia., 3200nm Highly Positive Dispersive Ultrafast Mirror

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UltraFast Innovations (UFI) 3200nm Highly-Positive Dispersive Ultrafast Mirrors

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Stock #17-063 3-4 days
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€1.159,00
Qty 1-9
€1.159,00
Qty 10+
€1.045,00
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Wedge (arcmin):
10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Coating Specification:
Ravg >99% @ 2800 - 3600nm (5° AOI, p-polarization)
GDD Specification:
500fs2 @ 2800 - 3600nm (5° AOI, p-polarization)
Wavelength Range (nm):
2800 - 3600
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Highly-Positive Dispersive (2800-3600nm)
Design Wavelength DWL (nm):
3200
Diameter (mm):
25.40 +0.00/-0.05
Thickness (mm):
6.35 ±0.20
Angle of Incidence (°):
5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)

Regulatory Compliance

RoHS 2015:
Compliant
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Certificate of Conformance:
View
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Reach 235:
Compliant
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Product Family Description

  • Positive GDD of 500 fs2 at 5° AOI
  • >99.9% Minimum Reflection (P-Polarization)
  • Broadband Mid-IR Coating Design Covers 2800 – 3600nm
  • Ideal for Mid-IR Mode-Locked Lasers

UltraFast Innovations (UFI) 3200nm Highly-Positive Dispersive Ultrafast Mirrors provide highly positive GDD with the same sign of GDD of most materials in this wavelength range. These positively chirped mirrors can be used for pulse compression and chirped-pulsed amplifier systems such as hybrid prism/mirror compressors. At a design angle of incidence (AOI) of 5°, these mirrors maximize the number of reflections between a pair of ultrafast mirrors while maintaining a small footprint. UltraFast Innovations (UFI) 3200nm Highly-Positive Dispersive Ultrafast Mirrors feature fused silica substrates with excellent thermal stability and a 25.4mm diameter to facilitate integration into mid-IR ultrafast laser setups. Please contact us if your laser system requires a custom size, wavelength, or pulse profile.