eo_logo
 
All Products / Optics / Ultrafast Optics / Low GDD Ultrafast Mirrors / Low GDD Ultrafast Mirrors
See all 1 Products in Family

760 - 840nm, 25.4mm Dia. x 5.00mm Thickness, Ultrafast Laser Line Mirror

×
Stock #85-103 Clearance 3-4 days
×
- +
€106,00
Qty 1+
€106,00
Volume Pricing
Request Quote
Get Product Downloads
Surface Quality:
20-10
Type:
Laser Mirror
Typical Applications:
Ti:Sapphire 1st Harmonic
Parallelism (arcmin):
<1
Clear Aperture (%):
>80
Durability:
MIL-C-675A
Back Surface:
Commercial Polish
Coating Specification:
Ravg >99% @ 760 - 840nm
GDD Specification:
0 ±30fs2 @ 740-860nm
Wavelength Range (nm):
760 - 840
Surface Flatness (P-V):
λ/8
Coating Type:
Dielectric
Coating:
Ultrafast (760-840nm)
Design Wavelength DWL (nm):
800
Diameter (mm):
25.40 +0.0/-0.1
Thickness (mm):
5.00 ±0.1
Angle of Incidence (°):
45
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Damage Threshold, By Design: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
1000-on-1: >0.25 J/cm2 @ 800nm, 100fs, 100Hz

Regulatory Compliance

RoHS 2015:
Compliant
×
Certificate of Conformance:
View
×
Reach 233:
Compliant
×

Product Family Description

Low Group Delay Dispersion (GDD) Ultrafast Mirrors are designed for applications utilizing Er:glass, Ti:sapphire, or Ytterbium-doped lasers. These laser mirrors are optimized for maximum reflection over broad wavelength ranges with designs available for wavelengths between 360 and 3300nm. The multilayer dielectric coating is designed for minimal GDD, making them ideal for ultrafast beam transport applications. Low GDD Ultrafast Mirrors feature low thermal coefficient substrates for applications with various ultrafast laser sources such as Ti:sapphire, Yb:doped, fiber, as well as OPA/OPO, and OPCPA systems.

Note: Please contact us for custom wavelengths, angles, and sizes.